Custom Designed Gas Source MBE System


This instrument is capable of accommodating 2”- 4” wafers heated up to 1000 °C. The heating elements of the sample stage are isolated from the vacuum ambient to eliminate unwanted deposition on the stage heater. The chamber has been designed to accommodate several gas source injectors and solid source evaporators to enhance the experimental versatility of the instrument. In situ monitoring of growth is achieved by RHEED.