Partial List of Facilities and Instrumentations
 
Synthesis/characterization and device fabrication equipment
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One cold-wall growth chamber with low pressure CVD capabilities for fabrication of III-V and II-VI materials on silicon substrates. The system achieves base pressures
  in the UHV range. Pumping is provided by a combination of high capacity turbo-molecular and cryo pumps.
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Clean-room facilities for preparation of Si substrates and device fabrication facilities.
7.
Synthetic inorganic/solid state chemistry laboratory.
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9.
   
Optical/electrical characterization
1.
2.
3.
4.
UV-Vis ellipsometer: Funded by an AFOSR instrumentation grant (PI Kouvetakis).
5.
6.
   
 
 
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